Growth mechanism of atomic layer deposition of zinc oxide: A density functional theory approach

ZnO by ALD - Advantages of the Material Grown at Low Temperature

(2016) E. Guziewicz et al.   ACTA PHYSICA POLONICA A

Computational investigation of surface reactivity of functionalized silicon surfaces in deposition processes

(2013) Jia-Ming Lin et al.   THEORETICAL CHEMISTRY ACCOUNTS

Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications

(2012) S.M. Sultan et al.   MICROELECTRONIC ENGINEERING

From nanogenerators to piezotronics—A decade-long study of ZnO nanostructures

(2012) Zhong Lin Wang   MRS BULLETIN

Atomic-scale simulation of ALD chemistry

(2012) Simon D Elliott   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Energy barriers for trimethylaluminum reaction with varying surface hydroxyl density

(2011) Dae-Hee Kim et al.   APPLIED SURFACE SCIENCE

ALD of ZnO using diethylzinc as metal-precursor and oxygen as oxidizing agent

(2011) E. Janocha et al.   APPLIED SURFACE SCIENCE

Effect of the damping function in dispersion corrected density functional theory

(2011) Stefan Grimme et al.   JOURNAL OF COMPUTATIONAL CHEMISTRY

The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD

(2010) Doyoung Kim et al.   APPLIED SURFACE SCIENCE

Investigation on Reaction Pathways for ZnO Formation from Diethylzinc and Water during Chemical Vapor Deposition

(2010)   BULLETIN OF THE KOREAN CHEMICAL SOCIETY

Initial growth mechanism of atomic layer deposition of ZnO on the hydroxylated Si(100)-2×1: A density functional theory study

(2009) Jie Ren   APPLIED SURFACE SCIENCE

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Structural and optical properties of low-temperature ZnO films grown by atomic layer deposition with diethylzinc and water precursors

(2008) I.A. Kowalik et al.   JOURNAL OF CRYSTAL GROWTH

The influence of growth temperature and precursors’ doses on electrical parameters of ZnO thin films grown by atomic layer deposition technique

(2008) T. Krajewski et al.   MICROELECTRONICS JOURNAL

Optical characterization of HfO2 by spectroscopic ellipsometry: Dispersion models and direct data inversion

(2008) Jordi Sancho-Parramon et al.   THIN SOLID FILMS