The influence of growth temperature and precursors’ doses on electrical parameters of ZnO thin films grown by atomic layer deposition technique

标题
The influence of growth temperature and precursors’ doses on electrical parameters of ZnO thin films grown by atomic layer deposition technique
作者
关键词
-
出版物
MICROELECTRONICS JOURNAL
Volume 40, Issue 2, Pages 293-295
出版商
Elsevier BV
发表日期
2008-09-19
DOI
10.1016/j.mejo.2008.07.053

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