Grinding and lapping induced surface integrity of silicon wafers and its effect on chemical mechanical polishing
出版年份 2022 全文链接
标题
Grinding and lapping induced surface integrity of silicon wafers and its effect on chemical mechanical polishing
作者
关键词
-
出版物
APPLIED SURFACE SCIENCE
Volume 599, Issue -, Pages 153982
出版商
Elsevier BV
发表日期
2022-06-15
DOI
10.1016/j.apsusc.2022.153982
参考文献
相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。- A review on chemical and mechanical phenomena at the wafer interface during chemical mechanical planarization
- (2021) Jihoon Seo JOURNAL OF MATERIALS RESEARCH
- An analytical model to predict the depth of sub-surface damage for grinding of brittle materials
- (2021) Jingfei Yin et al. CIRP Journal of Manufacturing Science and Technology
- Effect of abrasive particle shape on the development of silicon substrate during nano-grinding
- (2021) Yuhua Huang et al. COMPUTATIONAL MATERIALS SCIENCE
- A new model of grit cutting depth in wafer rotational grinding considering the effect of the grinding wheel, workpiece characteristics, and grinding parameters
- (2021) Yu Zhang et al. PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY
- High-Efficiency and Low-Damage Lapping Process Optimization
- (2020) Ci Song et al. Materials
- Research of Subsurface Damage Depth of Lithium Niobate Crystal by Fixed-Abrasive Lapping
- (2020) Zhu Nannan et al. INTEGRATED FERROELECTRICS
- Critique of materials‐based models of ductile machining in brittle solids
- (2020) Han Huang et al. JOURNAL OF THE AMERICAN CERAMIC SOCIETY
- Science and art of ductile grinding of brittle solids
- (2020) Han Huang et al. INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE
- Non-uniform abrasive particle size effects on friction characteristics of FKM O-ring seals under three-body abrasion
- (2019) Kun Qin et al. TRIBOLOGY INTERNATIONAL
- Analytical prediction for depth of subsurface damage in silicon wafer due to self-rotating grinding process
- (2019) Lixiang Zhang et al. CURRENT APPLIED PHYSICS
- Research on ground surface characteristics of prism-plane sapphire under the orthogonal grinding direction
- (2019) Wenxiang Zhao et al. APPLIED SURFACE SCIENCE
- Mechanisms of ductile mode machining for AlON ceramics
- (2019) Chunyu Zhang et al. CERAMICS INTERNATIONAL
- Subsurface Damage Detection on Ground Silicon Wafers Using Polarized Laser Scattering
- (2019) Jingfei Yin et al. JOURNAL OF MANUFACTURING SCIENCE AND ENGINEERING-TRANSACTIONS OF THE ASME
- Recent advances and applications of abrasive processes for microelectronics fabrications
- (2019) Zhao-Wei Zhong MICROELECTRONICS INTERNATIONAL
- Machining characteristics and mechanism of GO/SiO2 nanoslurries in fixed abrasive lapping
- (2019) Shuiquan Huang et al. JOURNAL OF MATERIALS PROCESSING TECHNOLOGY
- Optimization of lapping processes of silicon wafer for photovoltaic applications
- (2018) Savas Ozturk et al. SOLAR ENERGY
- Theoretical model and experimental analysis of chemical mechanical polishing with the effect of slurry for abrasive removal depth and surface morphology of silicon wafer
- (2018) Zone-Ching Lin et al. TRIBOLOGY INTERNATIONAL
- Generation and distribution of residual stress during nano-grinding of monocrystalline silicon
- (2018) Pei Chen et al. JAPANESE JOURNAL OF APPLIED PHYSICS
- Effect of stacking fault in silicon induced by nanoindentation with MD simulation
- (2015) Xiaoguang Guo et al. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
- Effects of ultra-smooth surface atomic step morphology on chemical mechanical polishing (CMP) performances of sapphire and SiC wafers
- (2015) Yan Zhou et al. TRIBOLOGY INTERNATIONAL
- The Role of Pad Topography in Chemical-Mechanical Polishing
- (2014) Sanha Kim et al. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
- Extended study of the atomic step-terrace structure on hexagonal SiC (0001) by chemical-mechanical planarization
- (2013) Xiaolei Shi et al. APPLIED SURFACE SCIENCE
- Phase transformations of mono-crystal silicon induced by two-body and three-body abrasion in nanoscale
- (2013) Jiapeng Sun et al. COMPUTATIONAL MATERIALS SCIENCE
- Effects of mixed abrasive grits in slurries on free abrasive machining (FAM) processes
- (2010) Sumeet Bhagavat et al. INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE
- Use of roughness probability parameters to quantify the material removed in plateau-honing
- (2010) Irene Buj Corral et al. INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE
- Nanoscratch-induced phase transformation of monocrystalline Si
- (2010) Y.Q. Wu et al. SCRIPTA MATERIALIA
- Chemical effect on the material removal rate in the CMP of silicon wafers
- (2010) Y.G. Wang et al. WEAR
- Grinding of silicon wafers: A review from historical perspectives
- (2008) Z.J. Pei et al. INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE
Become a Peeref-certified reviewer
The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.
Get StartedAsk a Question. Answer a Question.
Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.
Get Started