Atomic layer deposition of tungsten sulfide using a new metal-organic precursor and H2S: thin film catalyst for water splitting

标题
Atomic layer deposition of tungsten sulfide using a new metal-organic precursor and H2S: thin film catalyst for water splitting
作者
关键词
-
出版物
NANOTECHNOLOGY
Volume 32, Issue 7, Pages 075405
出版商
IOP Publishing
发表日期
2020-10-28
DOI
10.1088/1361-6528/abc50b

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