Atomic layer deposition of tungsten sulfide using a new metal-organic precursor and H2S: thin film catalyst for water splitting

Title
Atomic layer deposition of tungsten sulfide using a new metal-organic precursor and H2S: thin film catalyst for water splitting
Authors
Keywords
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Journal
NANOTECHNOLOGY
Volume 32, Issue 7, Pages 075405
Publisher
IOP Publishing
Online
2020-10-28
DOI
10.1088/1361-6528/abc50b

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