A controlled growth of WNx and WCx thin films prepared by atomic layer deposition

出版年份 2016 全文链接

标题

作者

关键词

Atomic layer deposition, Tungsten nitride, Tungsten carbide, N, 2, /H, 2, plasma, Phase, Microstructure

出版物

Volume 168, Issue -, Pages 218-222

出版商

Elsevier BV

发表日期

2016-01-17

DOI

10.1016/j.matlet.2016.01.071

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