What is limiting low-temperature atomic layer deposition of Al2O3? A vibrational sum-frequency generation study

Cooperation between adsorbates accounts for the activation of atomic layer deposition reactions

(2015) Mahdi Shirazi et al.   Nanoscale

First principles study of the atomic layer deposition of alumina by TMA–H2O-process

(2015) Timo Weckman et al.   PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Conformality of Plasma-Assisted ALD: Physical Processes and Modeling

(2010) H. C. M. Knoops et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films

(2010) S. E. Potts et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide

(2010) Vikrant R. Rai et al.   LANGMUIR

Quartz Crystal Microbalance Studies of Al2O3Atomic Layer Deposition Using Trimethylaluminum and Water at 125 °C†

(2009) R. A. Wind et al.   JOURNAL OF PHYSICAL CHEMISTRY A

Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy

(2008) E. Langereis et al.   APPLIED PHYSICS LETTERS

Detection of a Formate Surface Intermediate in the Atomic Layer Deposition of High-κ Dielectrics Using Ozone

(2008) Jinhee Kwon et al.   CHEMISTRY OF MATERIALS