First principles study of the atomic layer deposition of alumina by TMA–H2O-process

标题
First principles study of the atomic layer deposition of alumina by TMA–H2O-process
作者
关键词
-
出版物
PHYSICAL CHEMISTRY CHEMICAL PHYSICS
Volume 17, Issue 26, Pages 17322-17334
出版商
Royal Society of Chemistry (RSC)
发表日期
2015-06-08
DOI
10.1039/c5cp01912e

向作者/读者发起求助以获取更多资源

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search

Add your recorded webinar

Do you already have a recorded webinar? Grow your audience and get more views by easily listing your recording on Peeref.

Upload Now