Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride

标题
Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
作者
关键词
-
出版物
AIP Advances
Volume 6, Issue 6, Pages 065012
出版商
AIP Publishing
发表日期
2016-06-15
DOI
10.1063/1.4954238

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