Characterisation of the silicon nitride thin films deposited by plasma magnetron

标题
Characterisation of the silicon nitride thin films deposited by plasma magnetron
作者
关键词
-
出版物
SURFACE AND INTERFACE ANALYSIS
Volume 40, Issue 3-4, Pages 754-757
出版商
Wiley
发表日期
2008-02-08
DOI
10.1002/sia.2730

向作者/读者发起求助以获取更多资源

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Add your recorded webinar

Do you already have a recorded webinar? Grow your audience and get more views by easily listing your recording on Peeref.

Upload Now