Low temperature Ga2O3 atomic layer deposition using gallium tri-isopropoxide and water

标题
Low temperature Ga2O3 atomic layer deposition using gallium tri-isopropoxide and water
作者
关键词
-
出版物
THIN SOLID FILMS
Volume 546, Issue -, Pages 31-34
出版商
Elsevier BV
发表日期
2013-04-04
DOI
10.1016/j.tsf.2013.03.066

向作者/读者发起求助以获取更多资源

Publish scientific posters with Peeref

Peeref publishes scientific posters from all research disciplines. Our Diamond Open Access policy means free access to content and no publication fees for authors.

Learn More

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started