4.8 Article

Fabrication of Ordered, Large Scale, Horizontally-Aligned Si Nanowire Arrays Based on an In Situ Hard Mask Block Copolymer Approach

期刊

ADVANCED MATERIALS
卷 26, 期 8, 页码 1207-1216

出版社

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201304096

关键词

block copolymers; nanowires; patterning; silicon; photoelectron spectroscopy

资金

  1. Science Foundation Ireland through Semiconductor Research Corporation [2011-IN-2194, 09/SIRG/I1621]
  2. CSET CRANN grant

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