Self-assembly of polystyrene-block-poly(4-vinylpyridine) block copolymer on molecularly functionalized silicon substrates: fabrication of inorganic nanostructured etchmask for lithographic use
出版年份 2013 全文链接
标题
Self-assembly of polystyrene-block-poly(4-vinylpyridine) block copolymer on molecularly functionalized silicon substrates: fabrication of inorganic nanostructured etchmask for lithographic use
作者
关键词
-
出版物
Journal of Materials Chemistry C
Volume 1, Issue 47, Pages 7941
出版商
Royal Society of Chemistry (RSC)
发表日期
2013-10-22
DOI
10.1039/c3tc31498g
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