CMOS compatible strategy based on selective atomic layer deposition of a hard mask for transferring block copolymer lithography patterns

A Path to Ultranarrow Patterns Using Self-Assembled Lithography

(2010) Yeon Sik Jung et al.   NANO LETTERS

Metal Nanodot Memory by Self-Assembled Block Copolymer Lift-Off

(2009) Augustin J. Hong et al.   NANO LETTERS

Self-assembling study of a cylinder-forming block copolymer via a nucleation–growth mechanism

(2009) Karim Aissou et al.   NANOTECHNOLOGY

Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics, and Polymers

(2008) Seong-Jun Jeong et al.   ADVANCED MATERIALS

Fabrication of Well-Organized and Densely Packed Si Nanopillars Containing SiGe Nanodots by Using Block Copolymer Templates

(2008) Karim Aissou et al.   CHEMISTRY OF MATERIALS

Extreme ultraviolet lithography: Status and prospects

(2008) Jos Benschop et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Nanoimprint lithography: An old story in modern times? A review

(2008) Helmut Schift   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Surface roughness generated by plasma etching processes of silicon

(2008) M. Martin et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly

(2008) R. Ruiz et al.   SCIENCE