Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information
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Title
Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information
Authors
Keywords
ToF-SIMS, Argon cluster, SON68 glass, Perovskite oxide thin films, Sputtering rate, Charging alleviation
Journal
JOURNAL OF THE AMERICAN SOCIETY FOR MASS SPECTROMETRY
Volume 26, Issue 8, Pages 1283-1290
Publisher
Springer Nature
Online
2015-05-07
DOI
10.1007/s13361-015-1159-1
References
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