Improvement of Resistive Switching Stability of HfO2 Films with Al Doping by Atomic Layer Deposition

Title
Improvement of Resistive Switching Stability of HfO2 Films with Al Doping by Atomic Layer Deposition
Authors
Keywords
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Journal
ELECTROCHEMICAL AND SOLID STATE LETTERS
Volume 15, Issue 4, Pages H88
Publisher
The Electrochemical Society
Online
2012-01-25
DOI
10.1149/2.011204esl

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