Sub-250 nm low-threshold deep-ultraviolet AlGaN-based heterostructure laser employing HfO2/SiO2 dielectric mirrors

Title
Sub-250 nm low-threshold deep-ultraviolet AlGaN-based heterostructure laser employing HfO2/SiO2 dielectric mirrors
Authors
Keywords
-
Journal
APPLIED PHYSICS LETTERS
Volume 103, Issue 21, Pages 211103
Publisher
AIP Publishing
Online
2013-11-19
DOI
10.1063/1.4829477

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