Profile Control in Block Copolymer Nanostructures using Bilayer Thin Films for Enhanced Pattern Transfer Processes

Block Copolymer Lithography

(2013) Christopher M. Bates et al.   MACROMOLECULES

Directed self-assembly of block copolymers for next generation nanolithography

(2013) Seong-Jun Jeong et al.   Materials Today

Topologically Distinct Lamellar Block Copolymer Morphologies Formed by Solvent and Thermal Annealing

(2013) Ian P. Campbell et al.   ACS Macro Letters

Synthesis and thin-film orientation of poly(styrene-block-trimethylsilylisoprene)

(2012) Christopher M. Bates et al.   JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY

Modeling Line Edge Roughness in Templated, Lamellar Block Copolymer Systems

(2012) Paul N. Patrone et al.   MACROMOLECULES

Directed Self-Assembly of Lamellar Copolymers: Effects of Interfacial Interactions on Domain Shape

(2012) Ginusha M. Perera et al.   ACS Macro Letters

Three-Dimensional Multilayered Nanostructures with Controlled Orientation of Microdomains from Cross-Linkable Block Copolymers

(2011) Hyunjung Jung et al.   ACS Nano

Rectangular Patterns Using Block Copolymer Directed Assembly for High Bit Aspect Ratio Patterned Media

(2010) Ricardo Ruiz et al.   ACS Nano

Remediation of Line Edge Roughness in Chemical Nanopatterns by the Directed Assembly of Overlying Block Copolymer Films

(2010) Mark P. Stoykovich et al.   MACROMOLECULES

Self-assembly of block copolymer thin films

(2010) Julie N.L. Albert et al.   Materials Today

Directed Block Copolymer Assembly versus Electron Beam Lithography for Bit-Patterned Media with Areal Density of 1 Terabit/inch2 and Beyond

(2009) XiaoMin Yang et al.   ACS Nano

Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics

(2009) Ho-Cheol Kim et al.   CHEMICAL REVIEWS

Numerical investigation of relationship between micro-scale pattern, interfacial plasma structure and feature profile during deep-Si etching in two-frequency capacitively coupled plasmas in SF6/O2

(2009) Fukutaro Hamaoka et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Lift-off process using bilayer ultraviolet nanoimprint lithography and methacryloxypropyl-terminated-polydimethylsiloxane-based imprint resin

(2009) Ho Yong Jung et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Measuring the Structure of Epitaxially Assembled Block Copolymer Domains with Soft X-ray Diffraction

(2009) Gila E. Stein et al.   MACROMOLECULES

Templated Self-Assembly of Square Symmetry Arrays from an ABC Triblock Terpolymer

(2009) Vivian P. Chuang et al.   NANO LETTERS

Controlled Topology of Block Copolymer Gate Insulators by Selective Etching of Cylindrical Microdomains in Pentacene Organic Thin Film Transistors

(2008) Pil Sung Jo et al.   ADVANCED FUNCTIONAL MATERIALS

Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics, and Polymers

(2008) Seong-Jun Jeong et al.   ADVANCED MATERIALS

Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography

(2008) Yuk-Hong Ting et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Directed Self-Assembly of Diblock Copolymer Thin Films on Chemically-Patterned Substrates for Defect-Free Nano-Patterning

(2008) Yasuhiko Tada et al.   MACROMOLECULES

Electron beam lithography of HSQ/PMMA bilayer resists for negative tone lift-off process

(2008) Haifang Yang et al.   MICROELECTRONIC ENGINEERING

Patterning surfaces with functional polymers

(2008) Zhihong Nie et al.   NATURE MATERIALS

Directed Copolymer Assembly on Chemical Substrate Patterns:  A Phenomenological and Single-Chain-in-Mean-Field Simulations Study of the Influence of Roughness in the Substrate Pattern†

(2007) Kostas Ch. Daoulas et al.   LANGMUIR