Remediation of Line Edge Roughness in Chemical Nanopatterns by the Directed Assembly of Overlying Block Copolymer Films

Published 2010 View Full Article

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Title
Remediation of Line Edge Roughness in Chemical Nanopatterns by the Directed Assembly of Overlying Block Copolymer Films
Authors
Keywords
-
Journal
MACROMOLECULES
Volume 43, Issue 5, Pages 2334-2342
Publisher
American Chemical Society (ACS)
Online
2010-02-11
DOI
10.1021/ma902494v

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