Particle-in-Cell/Test-Particle Simulations of Technological Plasmas: Sputtering Transport in Capacitive Radio Frequency Discharges

An analytical particle mover for the charge- and energy-conserving, nonlinearly implicit, electrostatic particle-in-cell algorithm

(2013) G. Chen et al.   JOURNAL OF COMPUTATIONAL PHYSICS

Multiple frequency capacitively coupled plasmas as a new technology for sputter processes

(2013) S Bienholz et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Ti–Ar scattering cross sections by direct comparison of Monte Carlo simulations and laser-induced fluorescence spectroscopy in magnetron discharges

(2013) Daniel Lundin et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Simulation benchmarks for low-pressure plasmas: Capacitive discharges

(2013) M. M. Turner et al.   PHYSICS OF PLASMAS

Continuum and kinetic simulations of the neutral gas flow in an industrial physical vapor deposition reactor

(2013) Kirsten Bobzin et al.   SURFACE & COATINGS TECHNOLOGY

Kinetics of plasma species and their ionization in short-HiPIMS by particle modeling

(2013) T.M. Minea et al.   SURFACE & COATINGS TECHNOLOGY

Modeling and Simulation of Ion Energy Distribution Functions in Technological Plasmas

(2012) T. Mussenbrock   CONTRIBUTIONS TO PLASMA PHYSICS

Magnetron sputter deposition as visualized by Monte Carlo modeling

(2012) D. Depla et al.   THIN SOLID FILMS

Proper cell dimension and number of particles per cell for DSMC

(2011) Zhi-Xin Sun et al.   COMPUTERS & FLUIDS

An ionization region model for high-power impulse magnetron sputtering discharges

(2011) M A Raadu et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Energetic deposition of metal ions: observation of self-sputtering and limited sticking for off-normal angles of incidence

(2010) Hongchen Wu et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

On the possibility of making a geometrically symmetric RF-CCP discharge electrically asymmetric

(2008) Brian G Heil et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

The metal flux from a rotating cylindrical magnetron: a Monte Carlo simulation

(2008) K Van Aeken et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Sputtering yields

(2008) W. Eckstein   VACUUM