A Top Coat with Solvent Annealing Enables Perpendicular Orientation of Sub-10 nm Microdomains in Si-Containing Block Copolymer Thin Films
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Title
A Top Coat with Solvent Annealing Enables Perpendicular Orientation of Sub-10 nm Microdomains in Si-Containing Block Copolymer Thin Films
Authors
Keywords
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Journal
ADVANCED FUNCTIONAL MATERIALS
Volume 24, Issue 44, Pages 6981-6988
Publisher
Wiley
Online
2014-09-01
DOI
10.1002/adfm.201401678
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