Impact of Oxygen Vacancy on Ferroelectric Characteristics and Its Implication for Wake-Up and Fatigue of HfO2-Based Thin Films

Title
Impact of Oxygen Vacancy on Ferroelectric Characteristics and Its Implication for Wake-Up and Fatigue of HfO2-Based Thin Films
Authors
Keywords
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Journal
IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume 69, Issue 9, Pages 5297-5301
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Online
2022-07-21
DOI
10.1109/ted.2022.3190256

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