Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source

Near Ambient Pressure X-ray Photoelectron Spectroscopy Study of the Atomic Layer Deposition of TiO2 on RuO2(110)

(2015) Ashley R. Head et al.   Journal of Physical Chemistry C

Resolving ruthenium: XPS studies of common ruthenium materials

(2015) David J. Morgan   SURFACE AND INTERFACE ANALYSIS

Effect of ion bombardment on the structural and optical properties of TiO 2 thin films deposited from oxygen/titanium tetraisopropoxide inductively coupled plasma

(2015) D. Li et al.   THIN SOLID FILMS

Chemistry of active oxygen in RuOx and its influence on the atomic layer deposition of TiO2 films

(2014) Woojin Jeon et al.   Journal of Materials Chemistry C

Impact of plasma treatment on electrical properties of TiO2/RuO2based DRAM capacitor

(2013) Boris Hudec et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode

(2013) John Pointet et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Influence of growth temperature on the structure and electrical properties of high-permittivity TiO2films in TiCl4-H2O and TiCl4-O3atomic-layer-deposition processes

(2013) T. Arroval et al.   PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE

Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth

(2012) H. B. Profijt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Understanding the Interface Reactions of Rutile TiO2Grown by Atomic Layer Deposition on Oxidized Ruthenium

(2012) Mihaela Popovici et al.   ECS Journal of Solid State Science and Technology

Role of Interfacial Reaction in Atomic Layer Deposition of TiO2Thin Films Using Ti(O-iPr)2(tmhd)2on Ru or RuO2Substrates

(2011) Sang Woon Lee et al.   CHEMISTRY OF MATERIALS

Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study

(2011) Maarit Kariniemi et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Resolving surface chemical states in XPS analysis of first row transition metals, oxides and hydroxides: Sc, Ti, V, Cu and Zn

(2010) Mark C. Biesinger et al.   APPLIED SURFACE SCIENCE

Controlled growth of rutile TiO2 by atomic layer deposition on oxidized ruthenium

(2010) Mihaela Popovici et al.   Physica Status Solidi-Rapid Research Letters

Epitaxial growth of high-κ TiO[sub 2] rutile films on RuO[sub 2] electrodes

(2009) K. Fröhlich et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B