4.3 Article

Influence of sputtering power on the switching and reliability of ferroelectric Al0.7Sc0.3N films

Journal

JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 61, Issue SH, Pages -

Publisher

IOP Publishing Ltd
DOI: 10.35848/1347-4065/ac5db0

Keywords

AlScN; ferroelectricity; remnant polarization

Funding

  1. Murata Science Foundation

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The sputtering power dependence of 40 nm thick Al0.7Sc0.3N ferroelectric properties was investigated. Higher sputtering power resulted in better orientation growth along the c-axis and improved leakage current and breakdown field. High remnant polarization and low coercive field were achieved, and a wake-up effect was observed.
The sputtering power dependence of 40 nm thick Al0.7Sc0.3N ferroelectric properties was characterized from 200 to 300 W. X-ray rocking curve revealed higher orientated growth into the c-axis with higher sputtering power. Films formed by high power showed reduced leakage current with a higher breakdown field, enabling one to apply the high field for ferroelectric switching. A high remnant polarization (P (r)) of 130 mu C cm(-2) was obtained with a coercive field (E (c)) of 6 MV cm(-1). The switching cycle test revealed a wake-up effect for all the films; increasing the leakage current and modifying the E (c). We anticipate the change is attributed to the existence and the generation of nitrogen vacancies (V (N)) in the films. (c) 2022 The Japan Society of Applied Physics

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