Measurement of negative ion fluxes during DC reactive magnetron sputtering of Ti in Ar/O2 atmosphere using a magnetic-filtering probe

TiOx deposited by magnetron sputtering: a joint modelling and experimental study

(2018) R Tonneau et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Tutorial: Hysteresis during the reactive magnetron sputtering process

(2018) K. Strijckmans et al.   JOURNAL OF APPLIED PHYSICS

The existence of a double S-shaped process curve during reactive magnetron sputtering

(2016) R. Schelfhout et al.   APPLIED PHYSICS LETTERS

Magnetized retarding field energy analyzer measuring the particle flux and ion energy distribution of both positive and negative ions

(2015) Dmytro Rafalskyi et al.   REVIEW OF SCIENTIFIC INSTRUMENTS

A modified Katsumata probe—Ion sensitive probe for measurement in non-magnetized plasmas

(2015) M. Čada et al.   REVIEW OF SCIENTIFIC INSTRUMENTS

Ion angle distribution measurement with a planar retarding field analyzer

(2015) Shailesh Sharma et al.   REVIEW OF SCIENTIFIC INSTRUMENTS

Momentum transfer driven textural changes of CeO2 thin films

(2014) S. Van Steenberge et al.   APPLIED PHYSICS LETTERS

Experimental validation of the dual positive and negative ion beam acceleration in the plasma propulsion with electronegative gases thruster

(2014) Dmytro Rafalskyi et al.   JOURNAL OF APPLIED PHYSICS

The behaviour of negative oxygen ions in the afterglow of a reactive HiPIMS discharge

(2014) M Bowes et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

A time-dependent model for reactive sputter deposition

(2014) K Strijckmans et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

The correlation between the radial distribution of high-energetic ions and the structural as well as electrical properties of magnetron sputtered ZnO:Al films

(2013) André Bikowski et al.   JOURNAL OF APPLIED PHYSICS

Comparison of ion energies and fluxes at the substrate during magnetron sputtering of ZnO : Al for dc and rf discharges

(2013) Thomas Welzel et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Angle-resolved investigation of ion dynamics in high power impulse magnetron sputtering deposition system

(2013) Martin Čada et al.   THIN SOLID FILMS

Energy transferred to the substrate surface during reactive magnetron sputtering of aluminum in Ar/O2 atmosphere

(2013) A.L. Thomann et al.   THIN SOLID FILMS

A new grid-type electron filter for volume-production negative-ion source

(2012) D. V. Rafalskyi et al.   EPL

Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures

(2012) M. Macias-Montero et al.   JOURNAL OF APPLIED PHYSICS

Reactive magnetron sputtering of transparent conductive oxide thin films: Role of energetic particle (ion) bombardment

(2012) Klaus Ellmer et al.   JOURNAL OF MATERIALS RESEARCH

Negative ion energy distributions in reactive HiPIMS

(2012) M Bowes et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Negative oxygen ion formation in reactive magnetron sputtering processes for transparent conductive oxides

(2012) Thomas Welzel et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Resonance hairpin and Langmuir probe-assisted laser photodetachment measurements of the negative ion density in a pulsed dc magnetron discharge

(2011) James W. Bradley et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Investigation of the Negative Ions in Ar/O2 Plasma of Magnetron Sputtering Discharge with Al:Zn Target by Ion Mass Spectrometry

(2011) Petr Pokorný et al.   Plasma Processes and Polymers

Determination of energy modulations of negative oxygen ions during pulsed magnetron sputtering of magnesium oxide

(2011) Th Welzel et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

The influence of the target age on laterally resolved ion distributions in reactive planar magnetron sputtering

(2011) Thomas Welzel et al.   SURFACE & COATINGS TECHNOLOGY

In-situ analysis of positive and negative energetic ions generated during Sn-doped In2O3 deposition by reactive sputtering

(2011) Naoki Tsukamoto et al.   THIN SOLID FILMS

In-situ analyses on the reactive sputtering process to deposit Al-doped ZnO films using an Al–Zn alloy target

(2011) Naoki Tsukamoto et al.   THIN SOLID FILMS

The role of energetic ion bombardment during growth of TiO2thin films by reactive sputtering

(2010) A Amin et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Generation of Positive and Negative Oxygen Ions in Magnetron Discharge During Reactive Sputtering of Alumina

(2010) Petr Pokorný et al.   Plasma Processes and Polymers

O− density measurements in the pulsed-DC reactive magnetron sputtering of titanium

(2010) Robert Dodd et al.   THIN SOLID FILMS

Influence of negative ion resputtering on Al-doped ZnO thin films prepared by mid-frequency magnetron sputtering

(2009) Yongan Cai et al.   APPLIED SURFACE SCIENCE

Spatial Variation of Negative Oxygen Ion Energy Distribution in RF Magnetron Plasma with Oxide Target

(2009) Tatsuo Ishijima et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Determination of the effective electron emission yields of compound materials

(2008) D Depla et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS