Effect of working pressure and post-annealing on structural, optical and electrical properties of p-type NiO thin films produced by RF magnetron sputtering technique
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Title
Effect of working pressure and post-annealing on structural, optical and electrical properties of p-type NiO thin films produced by RF magnetron sputtering technique
Authors
Keywords
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Journal
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume 127, Issue 10, Pages -
Publisher
Springer Science and Business Media LLC
Online
2021-09-05
DOI
10.1007/s00339-021-04901-2
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