Effect of working pressure and post-annealing on structural, optical and electrical properties of p-type NiO thin films produced by RF magnetron sputtering technique

Title
Effect of working pressure and post-annealing on structural, optical and electrical properties of p-type NiO thin films produced by RF magnetron sputtering technique
Authors
Keywords
-
Journal
Publisher
Springer Science and Business Media LLC
Online
2021-09-05
DOI
10.1007/s00339-021-04901-2

Ask authors/readers for more resources

Reprint

Contact the author

Add your recorded webinar

Do you already have a recorded webinar? Grow your audience and get more views by easily listing your recording on Peeref.

Upload Now

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started