Effect of deposition power and pressure on rate deposition and resistivity of titanium thin films grown by DC magnetron sputtering

Title
Effect of deposition power and pressure on rate deposition and resistivity of titanium thin films grown by DC magnetron sputtering
Authors
Keywords
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Journal
SPECTROSCOPY LETTERS
Volume 49, Issue 8, Pages 514-519
Publisher
Informa UK Limited
Online
2016-07-23
DOI
10.1080/00387010.2016.1212244

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