A controlled growth of WNx and WCx thin films prepared by atomic layer deposition

Published 2016 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
Authors
Keywords
Atomic layer deposition, Tungsten nitride, Tungsten carbide, N, 2, /H, 2, plasma, Phase, Microstructure
Journal
MATERIALS LETTERS
Volume 168, Issue -, Pages 218-222
Publisher
Elsevier BV
Online
2016-01-17
DOI
10.1016/j.matlet.2016.01.071

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.