Metal-Assisted Chemical Etching and Electroless Deposition for Fabrication of Hard X-ray Pd/Si Zone Plates
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Title
Metal-Assisted Chemical Etching and Electroless Deposition for Fabrication of Hard X-ray Pd/Si Zone Plates
Authors
Keywords
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Journal
Micromachines
Volume 11, Issue 3, Pages 301
Publisher
MDPI AG
Online
2020-03-13
DOI
10.3390/mi11030301
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- (2014) Sophie-Charlotte Gleber et al. OPTICS EXPRESS
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- (2011) Xiuling Li CURRENT OPINION IN SOLID STATE & MATERIALS SCIENCE
- The Race to X-ray Microbeam and Nanobeam Science
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