RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate

Title
RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate
Authors
Keywords
-
Journal
Coatings
Volume 9, Issue 7, Pages 442
Publisher
MDPI AG
Online
2019-07-17
DOI
10.3390/coatings9070442

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