Effect of Oxygen Partial Pressure on the Electrical and Optical Properties of DC Magnetron Sputtered AmorphousTiO2Films

Substrate temperature influenced physical properties of silicon MOS devices with TiO2 gate dielectric

(2012) M. Chandra Sekhar et al.   SURFACE AND INTERFACE ANALYSIS

Effect of substrate bias voltage on the structure, electric and dielectric properties of TiO2 thin films by DC magnetron sputtering

(2011) M. Chandra Sekhar et al.   APPLIED SURFACE SCIENCE

GaAs metal–oxide–semiconductor device with titanium dioxide as dielectric layer: effect of oxide thickness on the device performance

(2011) Souvik Kundu et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Photo-induced hydrophilic properties of reactive RF magnetron sputtered TiO2 thin films

(2010) Junjie Xiong et al.   SURFACE & COATINGS TECHNOLOGY

Transparent and conducting TiO2:Nb films made by sputter deposition: Application to spectrally selective solar reflectors

(2009) C.M. Maghanga et al.   SOLAR ENERGY MATERIALS AND SOLAR CELLS

Systematic study of spectroscopic properties and thermal stability of lead germanate glass doped with rare-earth ions

(2007) B. Klimesz et al.   JOURNAL OF NON-CRYSTALLINE SOLIDS

Investigation on properties of TiO2 thin films deposited at different oxygen pressures

(2007) Yanming Shen et al.   OPTICS AND LASER TECHNOLOGY