RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate

标题
RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate
作者
关键词
-
出版物
Coatings
Volume 9, Issue 7, Pages 442
出版商
MDPI AG
发表日期
2019-07-17
DOI
10.3390/coatings9070442

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