Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide

PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads

(2018) Maximilian Gebhard et al.   ACS Applied Materials & Interfaces

A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD

(2018) Maximilian Gebhard et al.   Plasma Processes and Polymers

Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor

(2017) Sydney C. Buttera et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”

(2017) Esko Ahvenniemi et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Low-temperature gas-barrier films by atomic layer deposition for encapsulating organic light-emitting diodes

(2016) Ming-Hung Tseng et al.   NANOTECHNOLOGY

Structure and properties of Al2O3 thin films deposited by ALD process

(2016) P. Boryło et al.   VACUUM

Excellent silicon surface passivation using dimethylaluminium chloride as Al source for atomic layer deposited Al2O3

(2015) Shuo Li et al.   PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE

Energy-enhanced atomic layer deposition for more process and precursor versatility

(2013) S.E. Potts et al.   COORDINATION CHEMISTRY REVIEWS

History of atomic layer deposition and its relationship with the American Vacuum Society

(2013) Gregory N. Parsons et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Plasma-enhanced and thermal atomic layer deposition of Al2O3using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor

(2012) Stephen E. Potts et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells

(2012) G. Dingemans et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Approach for Al2O3rear surface passivation of industrial p-type Si PERC above 19%

(2012) Bart Vermang et al.   PROGRESS IN PHOTOVOLTAICS

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

(2011) H. B. Profijt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS