Suppression of Filament Overgrowth in Conductive Bridge Random Access Memory by Ta2O5/TaOx Bi-Layer Structure
Published 2019 View Full Article
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Title
Suppression of Filament Overgrowth in Conductive Bridge Random Access Memory by Ta2O5/TaOx Bi-Layer Structure
Authors
Keywords
Conductive bridge resistive switching memory (CBRAM), CMOS-compatible process, Bi-layer structure, Reliability
Journal
Nanoscale Research Letters
Volume 14, Issue 1, Pages -
Publisher
Springer Nature
Online
2019-03-28
DOI
10.1186/s11671-019-2942-x
References
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Related references
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- (2013) Takeki Ninomiya et al. IEEE TRANSACTIONS ON ELECTRON DEVICES
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- Diffusivity of Cu Ions in Solid Electrolyte and Its Effect on the Performance of Nanometer-Scale Switch
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