On the similarities between micro/nano lithography and topology optimization projection methods

Title
On the similarities between micro/nano lithography and topology optimization projection methods
Authors
Keywords
Topology optimization, Electron beam lithography, Proximity effects, Robust design, Projection filters, Design regularization
Journal
STRUCTURAL AND MULTIDISCIPLINARY OPTIMIZATION
Volume 48, Issue 4, Pages 717-730
Publisher
Springer Nature
Online
2013-06-11
DOI
10.1007/s00158-013-0941-6

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