4.6 Article

A Robust Computational Algorithm for Inverse Photomask Synthesis in Optical Projection Lithography

Journal

SIAM JOURNAL ON IMAGING SCIENCES
Volume 5, Issue 2, Pages 625-651

Publisher

SIAM PUBLICATIONS
DOI: 10.1137/110830356

Keywords

inverse lithography; image synthesis; total variation

Funding

  1. University Research Committee of the University of Hong Kong [10400898]
  2. Research Grants Council of the Hong Kong Special Administrative Region, China [HKU 7134/08E]
  3. UGC Areas of Excellence project Theory, Modeling, and Simulation of Emerging Electronics
  4. RGC GRF [HKBU202108, HKBU261007, HKBU261508]

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Inverse lithography technology formulates the photomask synthesis as an inverse mathematical problem. To solve this, we propose a variational functional and develop a robust computational algorithm, where the proposed functional takes into account the process variations and incorporates several regularization terms that can control the mask complexity. We establish the existence of the minimizer of the functional, and in order to optimize it effectively, we adopt an alternating minimization procedure with Chambolle's fast duality projection algorithm. Experimental results show that our proposed algorithm is effective in synthesizing high quality photomasks as compared with existing methods.

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