On the similarities between micro/nano lithography and topology optimization projection methods

标题
On the similarities between micro/nano lithography and topology optimization projection methods
作者
关键词
Topology optimization, Electron beam lithography, Proximity effects, Robust design, Projection filters, Design regularization
出版物
STRUCTURAL AND MULTIDISCIPLINARY OPTIMIZATION
Volume 48, Issue 4, Pages 717-730
出版商
Springer Nature
发表日期
2013-06-11
DOI
10.1007/s00158-013-0941-6

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