Inedible cellulose-based biomass resist material amenable to water-based processing for use in electron beam lithography

High mobility epitaxial graphene devices via aqueous-ozone processing

(2015) Tom Yager et al.   APPLIED PHYSICS LETTERS

Toxicity of tetramethylammonium hydroxide to aquatic organisms and its synergistic action with potassium iodide

(2015) Izumi C. Mori et al.   CHEMOSPHERE

Pulse radiolysis study of polystyrene-based polymers with added photoacid generators: Reaction mechanism of extreme-ultraviolet and electron-beam chemically amplified resist

(2015) Kazumasa Okamoto et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Trehalose glycopolymer resists allow direct writing of protein patterns by electron-beam lithography

(2015) Erhan Bat et al.   Nature Communications

Eco-friendly step-and-flash imprint lithography using ultraviolet-curing liquid material with lactulose derivative derived from medicinal drugs for biomicrochips

(2014) Satoshi Takei   JAPANESE JOURNAL OF APPLIED PHYSICS

Feasibility study of sub-10-nm half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: I. Latent image quality predicted by probability density model

(2014) Takahiro Kozawa et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

The Performances and Challenges of Today’s EB Lithography and EB-resist Materials

(2014) Masato Saito et al.   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

Organic solvent-free water-developable sugar resist material derived from biomass in green lithography

(2014) Satoshi Takei et al.   MICROELECTRONIC ENGINEERING

InGaN/GaN Core–Shell Single Nanowire Light Emitting Diodes with Graphene-Based P-Contact

(2014) M. Tchernycheva et al.   NANO LETTERS

Going green with silk

(2014) Alex Robinson   Nature Nanotechnology

Self-organized nanoparticle photolithography for two-dimensional patterning of organic light emitting diodes

(2014) Getachew T. Ayenew et al.   OPTICS EXPRESS

The performance of silicon solar cell with selective pillars fabricated by Cesium Chloride self-assembly lithography and UV-lithography

(2014) Jing Liu et al.   SOLAR ENERGY

Designing Lubricant-Impregnated Textured Surfaces to Resist Scale Formation

(2014) Srinivas Bengaluru Subramanyam et al.   Advanced Materials Interfaces

Electrodialysis Process for the Recycling and Concentrating of Tetramethylammonium Hydroxide (TMAH) from Photoresist Developer Wastewater

(2013) Yaoming Wang et al.   INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH

Tetramethylammonium Hydroxide Poisoning during a Pallet Cleaning Demonstration

(2013) Seung-Hyun Park et al.   JOURNAL OF OCCUPATIONAL HEALTH

Reduction of pattern peeling in step-and-flash imprint lithography

(2013) Satoshi Takei et al.   MICROELECTRONIC ENGINEERING

Eco-friendly electron beam lithography using water-developable resist material derived from biomass

(2012) Satoshi Takei et al.   APPLIED PHYSICS LETTERS

The role of the chemical burns caused by hydroxide ion in the toxicity of dermal exposure to tetramethylammonium ion in a rat model

(2012) Chen-Long Wu et al.   BURNS

Hazardous dyes removal from aqueous solution over mesoporous aluminophosphate with textural porosity by adsorption

(2012) Chellapandian Kannan et al.   JOURNAL OF HAZARDOUS MATERIALS

A Nanomechanical Resonator from HSQ Fabricated by FIB/EB Dual Beam Lithography

(2012) Shin^|^rsquo;ichi Warisawa et al.   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

Electron beam lithography designed silver nano-disks used as label free nano-biosensors based on localized surface plasmon resonance

(2012) Neval A. Cinel et al.   OPTICS EXPRESS

Electron Beam Lithography Using Highly Sensitive Negative Type of Plant-Based Resist Material Derived from Biomass on Hardmask Layer

(2011) Satoshi Takei et al.   Applied Physics Express

Step and Flash Nano Imprint Lithography of 80 nm Dense Line Pattern Using Trehalose Derivative Resist Material

(2010) Satoshi Takei   Applied Physics Express

Silicon-Containing Spin-on Underlayer Material for Step and Flash Nanoimprint Lithography

(2010) Satoshi Takei et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Plant-based resist materials for ultraviolet curing nanoimprint lithography

(2010) Satoshi Takei   Journal of Micro-Nanolithography MEMS and MOEMS

Cross-linking chitosan into UV-irradiated cellulose fibers for the preparation of antimicrobial-finished textiles

(2009) Diana Alonso et al.   CARBOHYDRATE POLYMERS

A novel noria (water-wheel-like cyclic oligomer) derivative as a chemically amplified electron-beam resist material

(2008) Hiroto Kudo et al.   JOURNAL OF MATERIALS CHEMISTRY