Electron Beam Lithography Using Highly Sensitive Negative Type of Plant-Based Resist Material Derived from Biomass on Hardmask Layer

Title
Electron Beam Lithography Using Highly Sensitive Negative Type of Plant-Based Resist Material Derived from Biomass on Hardmask Layer
Authors
Keywords
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Journal
Applied Physics Express
Volume 4, Issue 10, Pages 106502
Publisher
IOP Publishing
Online
2011-10-05
DOI
10.1143/apex.4.106502

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