Eco-friendly electron beam lithography using water-developable resist material derived from biomass

Fabrication of Anisotropic Metal Nanostructures Using Innovations in Template-Assisted Lithography

(2012) Zhao Tang et al.   ACS Nano

Neutron Reflectivity Characterization of the Photoacid Reaction-Diffusion Latent and Developed Images of Molecular Resists for Extreme Ultraviolet Lithography

(2012) Vivek M. Prabhu et al.   LANGMUIR

Localization of Multiple DNA Sequences on Nanopatterns

(2011) M. Serdar Onses et al.   ACS Nano

Nanostructured Ferroelectrics: Fabrication and Structure-Property Relations

(2011) Hee Han et al.   ADVANCED MATERIALS

DNA Separation in Nanowall Array Chips

(2011) Takao Yasui et al.   ANALYTICAL CHEMISTRY

Electron Beam Lithography Using Highly Sensitive Negative Type of Plant-Based Resist Material Derived from Biomass on Hardmask Layer

(2011) Satoshi Takei et al.   Applied Physics Express

Effect of selective nanopatterns on the performance of a pentacene-based thin-film transistor

(2011) Chang-Jae Yu et al.   APPLIED PHYSICS LETTERS

Study of fluorinated silicon-based resist material and photoreactive underlayer for defect reduction in step and repeat ultraviolet nanoimprint lithography

(2011) S. Takei et al.   Micro & Nano Letters

Very high sensitivity ZEP resist using MEK:MIBK developer

(2011) Babak Shokouhi et al.   Micro & Nano Letters

Silicon-Containing Spin-on Underlayer Material for Step and Flash Nanoimprint Lithography

(2010) Satoshi Takei et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Possibility of Forming 18-nm-Pitch Ultrahigh Density Fine Dot Arrays for 2 Tbit/in.2Patterned Media Using 30-keV Electron Beam Lithography

(2010) Sumio Hosaka et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Fabrication of novel microstructures based on orientation-dependent adsorption of surfactant molecules in a TMAH solution

(2010) Prem Pal et al.   JOURNAL OF MICROMECHANICS AND MICROENGINEERING

Difference of Spur Distribution in Chemically Amplified Resists upon Exposure to Electron Beam and Extreme Ultraviolet Radiation

(2009) Takahiro Kozawa et al.   JAPANESE JOURNAL OF APPLIED PHYSICS