High-density remote plasma sputtering of high-dielectric-constant amorphous hafnium oxide films

Structure and dielectric properties of amorphous high-κoxides: HfO2, ZrO2, and their alloys

(2012) Yin Wang et al.   PHYSICAL REVIEW B

Development of hafnium based high-k materials—A review

(2011) J.H. Choi et al.   MATERIALS SCIENCE & ENGINEERING R-REPORTS

Atomic Layer Deposition of Lanthanum Stabilized Amorphous Hafnium Oxide Thin Films

(2009) Tuo Wang et al.   CHEMISTRY OF MATERIALS

Addition of yttrium into HfO2 films: Microstructure and electrical properties

(2009) C. Dubourdieu et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Stability of thin film transistors incorporating a zinc oxide or indium zinc oxide channel deposited by a high rate sputtering process

(2009) A J Flewitt et al.   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Transparent and Photo-stable ZnO Thin-film Transistors to Drive an Active Matrix Organic-Light- Emitting-Diode Display Panel

(2008) Sang-Hee K. Park et al.   ADVANCED MATERIALS

Interface control and leakage current conduction mechanism in HfO2 film prepared by pulsed laser deposition

(2008) Hao Wang et al.   APPLIED PHYSICS LETTERS

Stable ZnO thin film transistors by fast open air atomic layer deposition

(2008) David H. Levy et al.   APPLIED PHYSICS LETTERS

Interface characterization and current conduction in HfO2-gated MOS capacitors

(2008) H.W. Chen et al.   APPLIED SURFACE SCIENCE

Structural and electronic properties of cubic HfO2 surfaces

(2008) G.H. Chen et al.   COMPUTATIONAL MATERIALS SCIENCE

High-Performance Flexible Hybrid Field-Effect Transistors Based on Cellulose Fiber Paper

(2008) Elvira Fortunato et al.   IEEE ELECTRON DEVICE LETTERS

Maximizing performance for higher K gate dielectrics

(2008) John Robertson   JOURNAL OF APPLIED PHYSICS

Amorphous IZO-based transparent thin film transistors

(2007) David C. Paine et al.   THIN SOLID FILMS