Sub-50 nm patterning by immersion interference lithography using a Littrow prism as a Lloyd’s interferometer

Published 2010 View Full Article

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Title
Sub-50 nm patterning by immersion interference lithography using a Littrow prism as a Lloyd’s interferometer
Authors
Keywords
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Journal
OPTICS LETTERS
Volume 35, Issue 20, Pages 3450
Publisher
The Optical Society
Online
2010-10-12
DOI
10.1364/ol.35.003450
References
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