Three-beam interference lithography: upgrading a Lloyd's interferometer for single-exposure hexagonal patterning

Published 2009 View Full Article

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Title
Three-beam interference lithography: upgrading a Lloyd's interferometer for single-exposure hexagonal patterning
Authors
Keywords
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Journal
OPTICS LETTERS
Volume 34, Issue 12, Pages 1783
Publisher
The Optical Society
Online
2009-06-03
DOI
10.1364/ol.34.001783
References
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