The fabrication of silicon nanostructures by local gallium implantation and cryogenic deep reactive ion etching

Published 2009 View Full Article

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Title
The fabrication of silicon nanostructures by local gallium implantation and cryogenic deep reactive ion etching
Authors
Keywords
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Journal
NANOTECHNOLOGY
Volume 20, Issue 6, Pages 065307
Publisher
IOP Publishing
Online
2009-01-15
DOI
10.1088/0957-4484/20/6/065307

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