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Title
Recent progress in low temperature nanoimprint lithography
Authors
Keywords
PMMA, PMAA, Nanoimprint Lithography, Squeeze Flow, Double Patterning
Journal
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS
Volume 21, Issue 1, Pages 1-7
Publisher
Springer Nature
Online
2014-11-22
DOI
10.1007/s00542-014-2366-6
References
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Related references
Note: Only part of the references are listed.- Low-temperature thermal nanoimprint lithography of anti-reflective structures for flexible low band gap organic solar cells
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- (2012) Fang Jiao et al. MICROELECTRONIC ENGINEERING
- Surface adhesion and demolding force dependence on resist composition in ultraviolet nanoimprint lithography
- (2011) Alborz Amirsadeghi et al. APPLIED SURFACE SCIENCE
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- (2010) Stefano Pagliara et al. NANOTECHNOLOGY
- Fabrication of planar organic nanotransistors using low temperature thermal nanoimprint lithography for chemical sensor applications
- (2010) J Kettle et al. NANOTECHNOLOGY
- Fabrication of a flexible multi-referenced surface plasmon sensor using room temperature nanoimprint lithography
- (2009) John P. Hulme et al. CURRENT APPLIED PHYSICS
- Cross-sectional observation of nanoimprint resins filled in SiO2/Si mold pattern using scanning electron microscopy
- (2009) Makoto Okada et al. MICROELECTRONIC ENGINEERING
- Replication of cancer cells using soft lithography bioimprint technique
- (2009) Fahmi Samsuri et al. MICROELECTRONIC ENGINEERING
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- (2009) Christoph Auner et al. ORGANIC ELECTRONICS
- Room Temperature Nanoimprint Lithography Using Molds Fabricated by Molecular Beam Epitaxy
- (2008) S. Harrer et al. IEEE TRANSACTIONS ON NANOTECHNOLOGY
- Ultrasonic Nanoimprint on Poly(ethylene terephthalate) at Room Temperature
- (2008) Harutaka Mekaru et al. JAPANESE JOURNAL OF APPLIED PHYSICS
- Finite element analysis of low temperature thermal nanoimprint lithography using a viscoelastic model
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- (2008) Chun-Chang Wu et al. MICROELECTRONIC ENGINEERING
- mr-NIL 6000LT – Epoxy-based curing resist for combined thermal and UV nanoimprint lithography below 50°C
- (2008) Christine Schuster et al. MICROELECTRONIC ENGINEERING
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