Journal
MICROELECTRONIC ENGINEERING
Volume 103, Issue -, Pages 126-130Publisher
ELSEVIER
DOI: 10.1016/j.mee.2012.10.012
Keywords
Moth-eye structure; UV nanoimprinting lithography; AAO mask; Solar cells
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Funding
- Shanghai Jiao Tong University Medical-Engineering Collaboration Fund [YG2010MS51]
- Shanghai Minhang Science and Technology Committee District-University Collaboration Program [2011MH060]
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Moth-eye structures were fabricated on monocrystalline silicon and monocrystalline silicon P-N junction solar cell surface respectively, using anodized aluminum oxide (AAO) membrane as a mask by means of UV nanoimprint lithography. A nano-scale pattern of porous alumina membrane mask was transferred to the UV-curable precursor with high fidelity by a fabrication process conducted at room temperature and normal atmosphere. The antireflection film reduced the surface reflection to about 4% in the wavelength of 425-1200 nm for silicon and improved the conversion efficiency by 19% for solar cells. The moderate fabrication condition made the method suitable for applications in different kinds of solar cells. (C) 2012 Elsevier B.V. All rights reserved.
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