Behavior of zirconium oxide films processed from novel monocyclopentadienyl precursors by atomic layer deposition

标题
Behavior of zirconium oxide films processed from novel monocyclopentadienyl precursors by atomic layer deposition
作者
关键词
-
出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume 27, Issue 1, Pages 226
出版商
American Vacuum Society
发表日期
2009-02-11
DOI
10.1116/1.3071844

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