Structural properties of as deposited and annealed ZrO2 influenced by atomic layer deposition, substrate, and doping

High resolution Rutherford Backscattering Spectrometry investigations of ZrO2 layer growth in the initial stage on native silicon oxide and titanium nitride

(2012) M. Vieluf et al.   THIN SOLID FILMS

Atomic Layer Deposition of High-kOxides of the Group 4 Metals for Memory Applications

(2009) Jaakko Niinistö et al.   ADVANCED ENGINEERING MATERIALS

First Insight Into the Lifetime Acceleration Model of High-$k$$\hbox{ZrO}_{2}/\hbox{SiO}_{2}/\hbox{ZrO}_{2}$ Stacks for Advanced DRAM Technology Nodes

(2009) R. Agaiby et al.   IEEE ELECTRON DEVICE LETTERS

Time dependent dielectric breakdown of amorphous ZrAlxOy high-k dielectric used in dynamic random access memory metal-insulator-metal capacitor

(2009) Dayu Zhou et al.   JOURNAL OF APPLIED PHYSICS

Behavior of zirconium oxide films processed from novel monocyclopentadienyl precursors by atomic layer deposition

(2009) Kaupo Kukli et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Impact of interface variations on J–V and C–V polarity asymmetry of MIM capacitors with amorphous and crystalline Zr(1−x)AlxO2 films

(2009) W. Weinreich et al.   MICROELECTRONIC ENGINEERING

Improved manufacturability of ZrO2 MIM capacitors by process stabilizing HfO2 addition

(2009) J. Müller et al.   MICROELECTRONIC ENGINEERING

Novel mixed alkylamido-cyclopentadienyl precursors for ALD of ZrO2 thin films

(2008) Jaakko Niinistö et al.   JOURNAL OF MATERIALS CHEMISTRY