Time dependent dielectric breakdown of amorphous ZrAlxOy high-k dielectric used in dynamic random access memory metal-insulator-metal capacitor

Published 2009 View Full Article

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Title
Time dependent dielectric breakdown of amorphous ZrAlxOy high-k dielectric used in dynamic random access memory metal-insulator-metal capacitor
Authors
Keywords
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Journal
JOURNAL OF APPLIED PHYSICS
Volume 106, Issue 4, Pages 044104
Publisher
AIP Publishing
Online
2009-08-27
DOI
10.1063/1.3204001
References
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