Methods of producing plasma enhanced chemical vapor deposition silicon nitride thin films with high compressive and tensile stress

Title
Methods of producing plasma enhanced chemical vapor deposition silicon nitride thin films with high compressive and tensile stress
Authors
Keywords
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Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 26, Issue 3, Pages 517-521
Publisher
American Vacuum Society
Online
2008-05-14
DOI
10.1116/1.2906259

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